Dark-field X-ray microscopy is a newly developed technique to measure orientation and strain in crystalline materials with spatial resolution down to 100 nm. At the end of the EBS shutdown, Beamline ID06 HXRM will be the first instrument worldwide to offer this technique via a general user programme. Furthermore, the project has been selected as one of the Upgrade Beamlines, EBSL2, to be constructed on ID03.

The aim of this workshop is to present this new instrument and seed a new user community. Via discussions with potential users, we aim to determine the needs of future users for instrumentation such as sample environments, auxiliary measurements, sample preparation, etc.

For further information, please see: Workshop on Dark Field X-ray Microscopy for EBSL2